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GOST 26239.0-84

GOST R ISO 15353-2014 GOST P 55080-2012 GOST R ISO 16962-2012 GOST R ISO 10153-2011 GOST R ISO 10280-2010 GOST R ISO 4940-2010 GOST R ISO 4943-2010 GOST R ISO 14284-2009 GOST R ISO 9686-2009 GOST R ISO 13899-2-2009 GOST 18895-97 GOST 12361-2002 GOST 12359-99 GOST 12358-2002 GOST 12351-2003 GOST 12345-2001 GOST 12344-88 GOST 12350-78 GOST 12354-81 GOST 12346-78 GOST 12353-78 GOST 12348-78 GOST 12363-79 GOST 12360-82 GOST 17051-82 GOST 12349-83 GOST 12357-84 GOST 12365-84 GOST 12364-84 STATE STANDARD P 51576-2000 GOST 29117-91 GOST 12347-77 GOST 12355-78 GOST 12362-79 GOST 12352-81 GOST P 50424-92 STATE STANDARD P 51056-97 GOST P 51927-2002 GOST P 51928-2002 GOST 12356-81 GOST R ISO 13898-1-2006 GOST R ISO 13898-3-2007 GOST R ISO 13898-4-2007 GOST R ISO 13898-2-2006 STATE STANDARD P 52521-2006 GOST P 52519-2006 GOST R 52520-2006 GOST P 52518-2006 GOST 1429.14-2004 GOST 24903-81 GOST 22662-77 GOST 6012-2011 GOST 25283-93 GOST 18318-94 GOST 29006-91 GOST 16412.4-91 GOST 16412.7-91 GOST 25280-90 GOST 2171-90 GOST 23401-90 GOST 30642-99 GOST 25698-98 GOST 30550-98 GOST 18898-89 GOST 26849-86 GOST 26876-86 GOST 26239.5-84 GOST 26239.7-84 GOST 26239.3-84 GOST 25599.4-83 GOST 12226-80 GOST 23402-78 GOST 1429.9-77 GOST 1429.3-77 GOST 1429.5-77 GOST 19014.3-73 GOST 19014.1-73 GOST 17235-71 GOST 16412.5-91 GOST 29012-91 GOST 26528-98 GOST 18897-98 GOST 26529-85 GOST 26614-85 GOST 26239.2-84 GOST 26239.0-84 GOST 26239.8-84 GOST 25947-83 GOST 25599.3-83 GOST 22864-83 GOST 25599.1-83 GOST 25849-83 GOST 25281-82 GOST 22397-77 GOST 1429.11-77 GOST 1429.1-77 GOST 1429.13-77 GOST 1429.7-77 GOST 1429.0-77 GOST 20018-74 GOST 18317-94 STATE STANDARD P 52950-2008 GOST P 52951-2008 GOST 32597-2013 GOST P 56307-2014 GOST 33731-2016 GOST 3845-2017 STATE STANDARD P ISO 17640-2016 GOST 33368-2015 GOST 10692-2015 GOST P 55934-2013 GOST P 55435-2013 STATE STANDARD P 54907-2012 GOST 3845-75 GOST 11706-78 GOST 12501-67 GOST 8695-75 GOST 17410-78 GOST 19040-81 GOST 27450-87 GOST 28800-90 GOST 3728-78 GOST 30432-96 GOST 8694-75 GOST R ISO 10543-99 GOST R ISO 10124-99 GOST R ISO 10332-99 GOST 10692-80 GOST R ISO 17637-2014 GOST P 56143-2014 GOST R ISO 16918-1-2013 GOST R ISO 14250-2013 GOST P 55724-2013 GOST R ISO 22826-2012 GOST P 55143-2012 GOST P 55142-2012 GOST R ISO 17642-2-2012 GOST R ISO 17641-2-2012 GOST P 54566-2011 GOST 26877-2008 GOST R ISO 17641-1-2011 GOST R ISO 9016-2011 GOST R ISO 17642-1-2011 STATE STANDARD P 54790-2011 GOST P 54569-2011 GOST P 54570-2011 STATE STANDARD P 54153-2010 GOST R ISO 5178-2010 GOST R ISO 15792-2-2010 GOST R ISO 15792-3-2010 GOST P 53845-2010 GOST R ISO 4967-2009 GOST 6032-89 GOST 6032-2003 GOST 7566-94 GOST 27809-95 GOST 22974.9-96 GOST 22974.8-96 GOST 22974.7-96 GOST 22974.6-96 GOST 22974.5-96 GOST 22974.4-96 GOST 22974.3-96 GOST 22974.2-96 GOST 22974.1-96 GOST 22974.13-96 GOST 22974.12-96 GOST 22974.11-96 GOST 22974.10-96 GOST 22974.0-96 GOST 21639.9-93 GOST 21639.8-93 GOST 21639.7-93 GOST 21639.6-93 GOST 21639.5-93 GOST 21639.4-93 GOST 21639.3-93 GOST 21639.2-93 GOST 21639.0-93 GOST 12502-67 GOST 11878-66 GOST 1763-68 GOST 13585-68 GOST 16971-71 GOST 21639.10-76 GOST 2604.1-77 GOST 11930.7-79 GOST 23870-79 GOST 11930.12-79 GOST 24167-80 GOST 25536-82 GOST 22536.2-87 GOST 22536.11-87 GOST 22536.6-88 GOST 22536.10-88 GOST 17745-90 GOST 26877-91 GOST 8233-56 GOST 1778-70 GOST 10243-75 GOST 20487-75 GOST 12503-75 GOST 21548-76 GOST 21639.11-76 GOST 2604.8-77 GOST 23055-78 GOST 23046-78 GOST 11930.11-79 GOST 11930.1-79 GOST 11930.10-79 GOST 24715-81 GOST 5639-82 GOST 25225-82 GOST 2604.11-85 GOST 2604.4-87 GOST 22536.5-87 GOST 22536.7-88 GOST 6130-71 GOST 23240-78 GOST 3242-79 GOST 11930.3-79 GOST 11930.5-79 GOST 11930.9-79 GOST 11930.2-79 GOST 11930.0-79 GOST 23904-79 GOST 11930.6-79 GOST 7565-81 GOST 7122-81 GOST 2604.3-83 GOST 2604.5-84 GOST 26389-84 GOST 2604.7-84 GOST 28830-90 GOST 21639.1-90 GOST 5640-68 GOST 5657-69 GOST 20485-75 GOST 21549-76 GOST 21547-76 GOST 2604.6-77 GOST 22838-77 GOST 2604.10-77 GOST 11930.4-79 GOST 11930.8-79 GOST 2604.9-83 GOST 26388-84 GOST 14782-86 GOST 2604.2-86 GOST 21639.12-87 GOST 22536.8-87 GOST 22536.0-87 GOST 22536.3-88 GOST 22536.12-88 GOST 22536.9-88 GOST 22536.14-88 GOST 22536.4-88 GOST 22974.14-90 GOST 23338-91 GOST 2604.13-82 GOST 2604.14-82 GOST 22536.1-88 GOST 28277-89 GOST 16773-2003 GOST 7512-82 GOST 6996-66 GOST 12635-67 GOST 12637-67 GOST 12636-67 GOST 24648-90

GOST 26239.0−84 semiconductor Silicon, the starting materials for its production and quartz. General requirements for methods of analysis

GOST 26239.0−84

Group B59


STATE STANDARD OF THE USSR

SEMICONDUCTOR SILICON, THE STARTING MATERIALS FOR ITS PRODUCTION AND QUARTZ

General requirements for methods of analysis

Semiconductor silicon, raw materials for its production and quartz. General requirements for methods of analysis


AXTU 1709

Valid from 01.01.86
to 01.01.91*
_________________________________
* Expiration removed
Protocol N 7−95 Interstate Council
for standardization, Metrology and certification
(IUS N 11, 1995). — Note the manufacturer’s database.



DEVELOPED by the Ministry of nonferrous metallurgy of the USSR

PERFORMERS

Y. A. Karpov, M. N. Schulepnikov, M. K. Vinnikov, G. G., Gavin, N. Gradskova, O. V. Zavialov, T. I. Zyablova, V. E., Quinn, V. A. Krylov, A. I. Kuzovlev, N. And. Marunya, V. G., Miscreants, V. M. Mikhailov, M. G. Nazarova, V. A. Orlov, A. I. Stepanov, N. With. Sysoeva, V. I. Firsov, G. I. Alexandrova

INTRODUCED by the Ministry of nonferrous metallurgy of the USSR

Member Of The Board Of A. P. Snurnikov

APPROVED AND put INTO EFFECT by Decision of the USSR State Committee on standards dated July 13, 1984 N 2490

1. This standard establishes General requirements for methods of analysis of semiconductor silicon, the starting materials to obtain (technical silicon, silicon tetrachloride, CHLOROSILANES, silicon dioxide) and quartz.

2. General requirements for methods of analysis GOST 26239.0−84 (ST SEV 314−76).

3. The selection and preparation of samples for analysis is carried out according to normative-technical documentation.

4. Of the sample and materials used for sample preparation and comparison of standard solutions weighed with an accuracy of 0.0002 g. more

5. For the taking of test portions used analytical laboratory scales type of VLA-200-M or VLR-20G, technical scales VPT-1, torsion scales W 500 GOST 13718−68 or similar types.

6. For heating solutions used electric cooker with a sealed coil according to GOST 14919−83.

7. For the preparation of solutions and tests used distilled water according to GOST 6709−72 and reagents qualification not lower than h. d. a., if you do not specify another.

8. For analysis use dimensional Petri dish below the second accuracy class according to GOST 20292−74* (burettes, pipettes) and GOST 1770−74 (cylinders, beakers, flasks), as well as glassware (beakers, conical flasks, etc.) according to GOST 25336−82, porcelain crucibles according to GOST 9147−80, quartz crucibles according to GOST 19908−80**, separating funnels, glass, conical GOST 25336−82, boxy glass according to GOST 25336−82, desiccators according to GOST 25336−82, dishes made of glassy carbon brand SU-2000.
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* On the territory of the Russian Federation there are 29169−91 GOST, GOST 29227−91−29229−91 GOST, GOST 29251−91-GOST 29253−91;
** On the territory of the Russian Federation GOST 19908−90. — Note the manufacturer’s database.

9. Allowed the use of other equipment, materials, utensils and reagents, subject to obtaining the metrological characteristics are not worse than specified in relevant standard methods of analysis.

10. In standard methods of analysis shows the allowable discrepancies under confidence probability ГОСТ 26239.0-84 Кремний полупроводниковый, исходные продукты для его получения и кварц. Общие требования к методам анализаof 0.95 or ГОСТ 26239.0-84 Кремний полупроводниковый, исходные продукты для его получения и кварц. Общие требования к методам анализаof 0.90 for multiple values of mass fraction. Allowable differences for intermediate values calculated by linear interpolation.

11. Validation of the results of the analysis of semiconductor grade silicon, or raw products to get it carried out at least once per month and at least ГОСТ 26239.0-84 Кремний полупроводниковый, исходные продукты для его получения и кварц. Общие требования к методам анализаonce a month, where ГОСТ 26239.0-84 Кремний полупроводниковый, исходные продукты для его получения и кварц. Общие требования к методам анализаis the number of samples analysed per month, using the same apparatus, reagents and materials.

12. The correctness of analysis results control the manner specified in respective state standards on methods of analysis.

13. Security requirements for conducting tests of semiconductor silicon and source products obtain it — according to normative-technical documentation. The order and types of training workers in occupational safety is carried out in accordance with GOST 12.0.004−79*.
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* On the territory of the Russian Federation GOST 12.0.004−90. — Note the manufacturer’s database.